Εξειδίκευση τύπου :	Άρθρο σε επιστημονικό περιοδικό
Τίτλος:	Advances in modeling and optimization for two-photon lithography
Δημιουργός/Συγγραφέας:	Sedova, Valeriia Ogor, Florie Rovera, Joël [EL] Τσιλιπάκος Οδυσσέας[EN] Tsilipakos, Odysseas Wiedenmann, Jonas Heggarty, Kevin Erdmann, Andreas
Ημερομηνία:	2025
Γλώσσα:	Αγγλικά
ISSN:	2708-8340
DOI:	10.1117/1.JMM.24.2.023001
Περίληψη:	Background: Two-photon polymerization (TPP) is one of the most promising methods for the fabrication of metasurfaces due to its ability to create complex, high-resolution nanostructures. However, fabricating these structures using TPP is complex, and predicting the results of the fabrication process is challenging. Aim: We aim to address these challenges by demonstrating how different modeling techniques can be employed to support the fabrication-aware design of metasurfaces. Approach: We introduce and explore three modeling techniques: a simple threshold model, a compact model, and a full model of polymerization. Each model offers different levels of complexity and accuracy. We assess how well each model performs and what limitations they have, using practical examples to show how they can guide the fabrication process. Results: Our comparison highlights the advantages and limitations of each modeling approach. The basic threshold model provides a general overview, focusing solely on the optical aspects and using a simple threshold for the photoresist. Thus, it lacks detailed descriptions of resist behavior. The compact model is semi-empirical, focusing on simplified chemical dynamics of a single species while including essential photochemical processes. By contrast, the full model of polymerization is the most advanced, offering a detailed description of various species involved in the process, such as monomers, polymers, and quenchers. Although it provides the most accurate predictions, it is also the most complex and computationally demanding.
Τίτλος πηγής δημοσίευσης:	Journal of Micro/Nanopatterning, Materials, and Metrology
Τόμος/Κεφάλαιο:	24
Τεύχος:	02
Θεματική Κατηγορία:	[EL] Οπτική. Φώς[EN] Optics. Light [EL] Φυσική και θεωρητική χημεία[EN] Physical and theoretical chemistry
Λέξεις-Κλειδιά:	voxels polymerization modeling lithography data modeling fabrication diffusion photoresist materials mathematical optimization 3D modeling
Χρηματοδότης:	European Union
EU Grant:	Horizon Europe research and innovation program
EU Grant identifier:	101091644
Κάτοχος πνευματικών δικαιωμάτων:	© The Authors.
Όροι και προϋποθέσεις δικαιωμάτων:	Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Ηλεκτρονική διεύθυνση στον εκδότη (link):	https://doi.org/10.1117/1.JMM.24.2.023001
Εμφανίζεται στις συλλογές:	Ινστιτούτο Θεωρητικής και Φυσικής Χημείας (ΙΘΦΧ) - Επιστημονικό έργο